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Etch Products from SPTS

Pegasus Leading edge Deep Reactive Ion Etching (DRIE) Technology for Silicon Etching http://www.stsystems.com/index.asp?m=1&s=113&ss=114

APS Advanced Planar Source for Etching of oxides, nitrides, SiC, and other materials with strong molecular bonds http://www.stsystems.com/index.asp?m=1&s=113&ss=116

ICP Inductively Coupled Plasma (ICP) for general purpose etching, including III-V materials http://www.stsystems.com/index.asp?m=1&s=113&ss=115

CVE Chemical Vapor Etch (CVE) for silicon release in MEMS applications http://www.stsystems.com/index.asp?m=1&s=113&ss=124

CET-3 and CET-25 HF Vapor Etch technology for oxide release in MEMS applications http://www.stsystems.com/index.asp?m=4&s=104&ss=105

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